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FORMATION OF ALLOY MICROSPHERES UNDER THE IMPLANTATION OF INTENSE PULSED ION BEAMS
<正> I. INTRODUCTION Implantation with intense pulsed ion beams causes great changes of morphology, microstructure and physicochemical behaviours of doped area of the metal target due to atomic mixing, rapid melting and quenching, and shock pressure. In the previous works,the results of microcrystallization and noncrystallization of implanted samples by pulsed ion
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Chinese Science Bulletin
1989年17期

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